beautiful parfum — FAMA
55 ml of light green eau de parfum/ woda perfumowana.
- Risk level
- Serious risk
- Tipo
- Chemical
- Categoria
- Cosmetics
- Origin
- People's Republic of China
Hazard: The perfume contains the fragrances butylphenyl methylpropional, benzyl salicylate, hexyl cinnamal, alpha - isomethyl ionone, linalool, citronellol and hydroxycitronellal (measured values: 0.11 %, 0.054 %, 0.044 %, 0.038 %, 0.025 %, 0.024 % and 0.011 % by weight, respectively). Since these substances, which can induce allergic reactions and sensitisation, are not indicated in the list of ingredients, consumers are not aware of their presence.
⚖️ Ações ordenadas pelas autoridades
- ▸ (to: Retailer) Withdrawal of the product from market
What is this? This is a perfume called “beautiful parfum — FAMA.” It has smells that can cause allergies.
What's happening? The perfume has hidden smells that may cause skin rashes or allergies. The list of ingredients does not show these smells.
Does this affect me? If you use this perfume and get a rash or itchy skin, you may be affected.
What should I do? Stop using the perfume and ask your pharmacist or doctor what to do next.
🤖 Este resumo em linguagem simples é gerado automaticamente a partir do comunicado oficial da agência, com recurso a IA. Destina-se apenas a fins informativos — não constitui aconselhamento médico. Para tomar decisões sobre a sua saúde, consulte sempre um farmacêutico ou médico e leia a fonte oficial vinculada abaixo.
🔬 Detalhes médicos/técnicos (para profissionais)
Risk level: Serious risk · Type: Chemical · Category: Cosmetics · Hazard: The perfume contains the fragrances butylphenyl methylpropional, benzyl salicylate, hexyl cinnamal, alpha - isomethyl ionone, linalool, citronellol and hydroxycitronellal (measured values: 0.11 %, 0.054 %, 0.044 %, 0.038 %, 0.025 %, 0.024 % and 0.011 % by weight, respectively). Since these substances, which can induce allergic reactions and sensitisation, are not indicated in the list of ingredients, consumers are not aware of their presence. · Origin: People's Republic of China
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